Investigation of novel dual work function metal gate technologies
博士 === 國立交通大學 === 電子工程系所 === 94 === Two novel dual work function metal gate technologies are investigated and proposed. With the down-scaling of the device geometry for performance improvement, inherent drawbacks of conventional polysilicon gate electrodes lead to increasingly significant negative i...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/54541603074669381461 |