A Dynamical Model Tuning and Non-linear Minimum Variance Controller for Advanced Photolithography Process Control
碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程學程 === 94 === This thesis presents a new run-to-run (R2R) multiple-input-single-out controller for photolithography process. The controller, termed dynamical minimum variance controller, can act both as a dynamical model optimizer and as a controller for given mode...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53054639220542520545 |