Application of reversal imprinting for micro- and nano-pattering
碩士 === 國立成功大學 === 微機電系統工程研究所 === 94 === Abstract Nanoimprint lithography, a high-throughput, low-cost, non- conventional lithographic method proposed and demonstrated recently, has been developed and investigated further. Further experimental study indicates that the ultimate resolution of nanoimpr...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/58504685220890375263 |