A Study on Microstructure and Mechanical Properties of Nanocomposite Films Deposited by Physical Vapor Deposition

博士 === 國立成功大學 === 機械工程學系碩博士班 === 94 === In this study, we utilized the method of physical vapor deposition (PVD) to form the single-layer C, two-layer C/a-Si and three-layer a-Si/C/a-Si nanocomposite films using ultra high vacuum ion beam sputtering (UHV IBS) system, Ti-containing diamond-like hydro...

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Bibliographic Details
Main Authors: Bo-Hsiung Wu, 吳博雄
Other Authors: Chen-Kuei Chung
Format: Others
Language:en_US
Online Access:http://ndltd.ncl.edu.tw/handle/82072871094886530727