Development of Multiple Beam Interferometry Apparatus to Measure Thin Film Thickness and Refractive Index

碩士 === 國立成功大學 === 機械工程學系碩博士班 === 94 === The material will show remarkable different characteristic and phenomenon in the nano scale. It has become unlackable to build and use precise measuring technology and system to understand and control the material characteristic. The surface force apparatus n...

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Bibliographic Details
Main Authors: Shih-Kuo Hu, 胡世國
Other Authors: Terry Yuan-Fang Chen
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/76604651601997431860