Development of Multiple Beam Interferometry Apparatus to Measure Thin Film Thickness and Refractive Index
碩士 === 國立成功大學 === 機械工程學系碩博士班 === 94 === The material will show remarkable different characteristic and phenomenon in the nano scale. It has become unlackable to build and use precise measuring technology and system to understand and control the material characteristic. The surface force apparatus n...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2006
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Online Access: | http://ndltd.ncl.edu.tw/handle/76604651601997431860 |