A Study on the microstructure and mechanical properties of Ta-Si-N nanocomposite thin films by reactive co-sputtering

碩士 === 國立成功大學 === 機械工程學系碩博士班 === 94 === In this study, the nanocomposites of Ta-Si-N thin films were prepared by reactive magnetron co-sputtering system and were annealed by RTA in various temperatures. With different temperatures, the thin films were used to be examined its thermal stability. This...

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Bibliographic Details
Main Authors: Tai-Sheng Chen, 陳泰盛
Other Authors: Chen-Kuei Chung
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/69960881272434104232