Numerical Simulation of Rapid Thermal Chemical Vapor Deposition
碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 94 === In this thesis the Rapid Thermal Chemical Vapor Deposition of silicon in a RTP furnance with six heating rings is studied numerically. The 300 mm silicon wafer is heated rapidly to the designated process temperature and then maintains at that temperature un...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/45427437299163223074 |