| Summary: | 碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 94 === Self-assembled monolayers (SAMs) are capable to form a functionalized surface on a metal surface with good uniformity and stability. In this study, alkanethiolate molecules with -CH3 terminated tail group chemically adsorb upon Au substrate and form Au-S bonds, which potentially act as ultra-thin resist films with excellent uniformity in molecular order and high resistivity to chemicals. Anti-etching mechanism of the patterned self-assembled Octadecanethiol (ODT) on Au (111)-dominant surface has been mainly discussed. In the experiment, the end point of Au etching process was determined by ellipsometry and AFM. The patterned SAMs were fabricated using microcontact printing (μCP) technique and subsequent to be developed by Au etching solution. The images of element distribution on the patterned Au were investigated by SPEM. Subsequently surface morphology of the patterned Au was then characterized by AFM and SEM. At the same time, the damaged SAMs in association with the morphology of Au were discussed. Experimental results demonstrated that the damaged pattern at the boundary between the μCP SAMs and the etched part was clearly identified. The SAMs protected part was resistive to a specific etching solution, whereas SAMs at the patterned boundary exhibited weak in resisting the analogous solution. Potentially alkanethiols adsorbed on PDMS stamp tend to diffuse away from the region of contact; thereafter the residual Au in the non-contact region is unable to be removed completely during the etching process. It is suggested to reduce the effect of incomplete etching process by shortening the printing time or extending the etching time.
|
|---|
