Numerical Simulation and Analysis on Nanoimprinting Process

碩士 === 國立成功大學 === 土木工程學系碩博士班 === 94 === We developed a two-dimensional finite element model to simulate the deformation of the imprinting materials caused by the compression of the mold in nanoimprint lithography process. The FEM model is built based on the dynamic analysis of a viscoelastic solid....

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Bibliographic Details
Main Authors: Wen-Che Chang, 張文哲
Other Authors: Y. Y. Lin
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/69211760721884000435