Stripping of CrN thin films by electrochemical methods with different electrolytes

碩士 === 中興大學 === 材料工程學系所 === 94 === This research mainly employs electrochemical methods under alkaline, acid, and neutral electrolytes to strip the chromium nitride thin films that were deposited by cathodic arc plasma technique on Si wafer (CrN/Si). Moreover, the CrN coated on 304 stainless steel s...

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Bibliographic Details
Main Authors: Yu-Ling Lai, 賴玉鈴
Other Authors: Fu-Hsing Lu
Format: Others
Language:zh-TW
Published: 2006
Online Access:http://ndltd.ncl.edu.tw/handle/29985377861923876111