Preparation and Nanomechanical Properties of Porous SiO2 Low-Dielectric-Constant Films
碩士 === 國立中興大學 === 材料工程學系所 === 94 === In this study, porous SiO2 low-dielectric-constant films containing different porosities and sizes of uniformly distributed pores were prepared. The nanomechanical properties of the porous SiO2 films were analyzed by a nanoindentation test. The hardness and elast...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2006
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71440813628203783936 |