| Summary: | 碩士 === 逢甲大學 === 材料與製造工程所 === 94 === In the thin film transistor liquid-crystal display industry domain, to remove the dust particle form glass plate surface, there are mainly dry and wet types of cleaning technologies. The paper takes dry cleaner to be the cleaning technology as the research foundation because it has been studied among the development various types cleaning technology and as succeeded technology of the plant use, removes the glass foundation plate surface dust particle. Foundation of this research is under this high-velocity current auxiliary by the ultra-sonic wave technology discussion glass foundation plate on the particle removing mechanism and the potency.
In this article, first, we will make the literature review of the surface cleaning technology at present. The theories of ultra-sonic wave, basic hydromechanics, and the cause analysis of particle attaching the glass foundation plate, will also be mentioned. By means of establishment of the ultra-sonic wave air current particle removing pattern, we obtained parameters of the different particle removing rate and applied them to D.O.E（Design of Experiment）and static software MINITAB. With the investigation of the interactive impact of factors, we found that the optimistic parameter to control the mechanism of particle remove by ultra-sonic wave.
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