Development and Applications of a Ultra-violet Lithography Variable Focal Length Rapid Prototyping Fabrication for Micro-structure Components

• Main Authors: Liang-Xuan Su, 蘇良軒
• Other Authors: Ming-Yih Lee
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/52030933150487409190

碩士 === 長庚大學 === 機械工程研究所 === 94 === The precise manufature of micro-structure componets is the mainly significant technique of Micro-Electro-Mechanical Systems (MEMS). According to the definition of Science & Technology Policy Reseach Center (STPI) micro-structure component means that size or precision is between 10 and 100 μm. Presently, manufacturing micro-structure components have to use semiconductor fabrication method for the most part. The semiconductor fabrication method for micro-structure components has very expensive and complex fabrication process, which requires mask, a huge clean room and lithography environment. However, it is not a smart method to fabricate micro-structure components if these sizes or precision are between 10 and 100 μm. In recently years, rapid prototyping technique has become a new method for making industrial components. It is an automated manufacturing process that quickly builds physical models from three-dimention (3-D) prototype computer-aided design files. It also can dramatically speed up design and manufacturing processes and substantially reduced the cost. Even so, most of the rapid prototyping machines only can fabricate components which precision are larger than 100 μm and are not suitable to manufacture micro-structure components. Therefore, the aim of this research is to design and construct a new system, Ultra-violet Lithography Variable Focal Length Rapid Prototyping system, without all the above mentioned disadvantages. And by using the new system to fabricate micro-structure components, we can reduce the cost and fabricate micro-structure components near to 10 μm. This research comprises of three different parts. The first part was the hardware develop of the “Ultra-violet Lithography Variable Focal Length Rapid Prototyping system” machine.The work included function evaluation of platform , setup of work manual, frame design and structural design by Solidwork, pressure-damper module develop, spin coating platform develop, a dust-collecting plant design, material supply module develop, Variable Focal Length motion platform develop, micro motion platform set-up, adaptive light source control module develop, and IC control module design. The second part was the software develop of the “Ultra-violet Lithography Variable Focal Length Rapid Prototyping system” machine. The work included CAD file slicing for micro-structure component, UV exposure profile programming and human-machine interface software design. This involved using CopyCAD and Visual Basic to design the software window platform for micro-structure component slicing, using PowerMill and Visual Basic to design the software window platform for UV exposure profile programming and using Visual Basic to design the human-machine interface software window platform. The third part was to combine the “Ultra-violet Lithography Variable Focal Length Rapid Prototyping system” machine with the CAD file slicing module for micro-structure component and UV exposure profile programming module and builded the physical machine. This includes the testing of both hardware and software of the machine. Lastly, to test the machine by fabricating micro-structure components. Recently, we can reduce the disadvantages of the traditional semiconductor fabrication method by developing our micro-structure components within a comparatively small dust-free and lithography environment. In addition, this system can decrease the cost and is capable of producing more micro-structure components up to 10 μm.