Study of via first dual damascene process
碩士 === 南台科技大學 === 電子工程系 === 93 === Much progress has been made in the IC manufacturing. The feature size of 0.13 m, 90 nm 65 nm or below have been the main stream of the IC manufacturing. For the photolithography in the IC process, G-line, I-line, DUV (Deep-Ultra-Violet) and even EUV (Extreme-Ultra...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/26892255189661670810 |