Measurement of Diffusion Coefficients of Copper in TiNX Diffusion Barriers
碩士 === 國立臺灣科技大學 === 材料科技研究所 === 93 === The study is to evalucate the obstruction of Cu in TiNx films deposited by RF magnetron-sputtering system. The grain size, crystal structure, crystal arrangement, chemical composition and other terms for TiNx films deposited by RF magnetron-sputtering system we...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/39709956202720125159 |