Scanning Near Field Optical Microscopy Lithography Dot Processed Mode Analysis of Photoresist layer Coating Indium Thin Film
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 93 === The objective of this research is to study an innovative lithography using the effect of thermal-induced super resolution, and to demonstrate that the technique can effectively reduce the exposed pit width on the photoresist layer. The technique makes use o...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/56307988414613459071 |