Applications of Low Dielectric Materials for Thin-Film-Transistor Display
碩士 === 國立清華大學 === 電子工程研究所 === 93 === Abstract In this thesis, we investigated the application of low-dielectric-constant (low-k) hydrogen silsesquioxane (HSQ) for thin-film-transistor (TFT) technology. Low-k HSQ has the properties of the high transmittance (>90% at 300~800 nm), low photo leakage...
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| Format: | Others |
| Language: | en_US |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05711143541082761944 |