Accurate Interconnect Capacitance Modeling for Microloading Effect in Nanometer Technologies

碩士 === 國立清華大學 === 資訊工程學系 === 93 === The foundry provides not only the design rules but also resistances and capacitances of the mainstream test structures of interconnect for designers in the process of the back-end of line of VLSI. These capacitances and resistances affect the design of circuits an...

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Bibliographic Details
Main Author: 黃俊富
Other Authors: 張克正
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/96345009254599726328