Effects of TiN Capped Layer on Ti/Si Reaction System

碩士 === 國立清華大學 === 材料科學工程學系 === 93 === Abstract Ti/Si and TiN/Ti/Si structures were annealed in vacuum to observe the reaction sequence. The stress of the film was determined in situ by measuring the curvature of the sample during the isochronal annealing process. The phases of the film after anneal...

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Bibliographic Details
Main Authors: Wei-Cheng Lin, 林威成
Other Authors: Cho-Jen Tsai
Format: Others
Language:en_US
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/77001244557967097485