ZnO: Al transparent conducting films sputtering and wet etching process and analysis
碩士 === 國立彰化師範大學 === 機電工程學系 === 93 === In this thesis, we used chemical wet etching to discuss patterning characteristics of AZO films, including etching rates, and etching residue formations of the patterned films. First, we controlled parameters including RF power、substrate temperature and anneal t...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
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| Online Access: | http://ndltd.ncl.edu.tw/handle/59290330886132203101 |