DC magnetron sputtering of optical thin films in low energy ion beam

• Main Authors: Der-Jun Jan, 詹德均
• Other Authors: Cheng-Chung Lee
• Format: Others
• Language: zh-TW
• Published: 2005
• Online Access: http://ndltd.ncl.edu.tw/handle/13523658375749592425

博士 === 國立中央大學 === 光電科學研究所 === 93 === Magnetron sputtering is a low temperature deposition process and suitable for use with polymer substrates. However, the films deposited by magnetron sputtering did not have perfect optical properties due to the low temperature process. In this study, we combined DC magnetron sputtering and ion assistance to deposit a thin metal film and then to oxidize this film with ion bombardment to form metal oxide in separate zones of the deposition chamber. The ion assistance increased the kinetic energy of the deposited atoms on the substrate, and the separation of deposition zone and oxidation zone kept the sputtering target in the transition mode. Both modifications improved the properties of optical thin films deposited by conventional reactive magnetron sputtering. The single layer of Ta2O5 and SiO2 was deposited by magnetron sputtering and ion-beam oxidation (IBO). The effects of ion energy, ion current, oxygen gas ratio in ion beam, and sputtering power on the optical properties and deposition rate were investigated. Moreover, the PMMA surface was modified by ion irradiation to increase the adhesion of the coatings on substrate. These results showed that IBO method may be one of promising methods to deposit the optical thin films with high packing density and high resistance to the harsh environment.