Fabrication and applications of nano-gap electrode arrays

碩士 === 國立暨南國際大學 === 電機工程學系 === 93 === Nowadays, the fabrication of nano electrodes is mainly done by electron beam lithography (E-beam lithography). However, there are some drawbacks of E-beam lithography, such as low throughput and high productive cost. In order to have higher throughput to depoly...

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Bibliographic Details
Main Authors: Sung-Lin Chiang, 蔣松霖
Other Authors: Jeng-Tzong Sheu
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/77657551690894469666