Fabrication of Metal Silicide Nanowire Using Atomic Force Microscope
碩士 === 國立暨南國際大學 === 電機工程學系 === 93 === Schottky barriers are used in a variety of devices and circuit applications, such as the gate electrode of the field-effect transistor, the drain and source contacts in SB MOSFET and Single Electron Transistors(SETs). We propose a fabrication process for one-dim...
Main Authors: | Hsieh-Tang Tsai, 蔡協唐 |
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Other Authors: | Jeng-Tzong Sheu |
Format: | Others |
Language: | zh-TW |
Published: |
2005
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Online Access: | http://ndltd.ncl.edu.tw/handle/55784554533553241765 |
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