Fabrication of Metal Silicide Nanowire Using Atomic Force Microscope

碩士 === 國立暨南國際大學 === 電機工程學系 === 93 === Schottky barriers are used in a variety of devices and circuit applications, such as the gate electrode of the field-effect transistor, the drain and source contacts in SB MOSFET and Single Electron Transistors(SETs). We propose a fabrication process for one-dim...

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Bibliographic Details
Main Authors: Hsieh-Tang Tsai, 蔡協唐
Other Authors: Jeng-Tzong Sheu
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/55784554533553241765