The Unifcvmity Control of ITO Thin Film Deposition with RF Magnetron Sputtering and Wideband Dynamic Film Thickness Monitoring
碩士 === 輔仁大學 === 物理學系 === 93 === A dynamic film thickness control system/method and its coating method consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for realtime control over deposited film thickness and graduall...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2005
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/32787167381523158601 |