The Growth Mechanism of Polycrystalline Diamond Thin Films Deposited by MACVD under Bias with Diamond Seed Embedded

碩士 === 大葉大學 === 電機工程學系碩士班 === 93 === The grain size in polycrystalline diamond films is determined by many factors including growth period, ratio of reacting gases, and nucleation mechanism. In this study, using CH4 and H2 as working gas, microwave assisted CVD was utilized to deposit polycrystallin...

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Bibliographic Details
Main Authors: Chi-Wei Chiao, 焦繼葳
Other Authors: Shih-Fong Lee
Format: Others
Language:zh-TW
Published: 2005
Online Access:http://ndltd.ncl.edu.tw/handle/77627594864885722082