The study on the properties of tantalum oxide and hafnium oxide thin films by reactive radio-frequency sputtering
碩士 === 南台科技大學 === 電機工程系 === 92 === In this research, TaOx and HfOx thin films were deposited onto (100) n+-Si wafers by radio frequency magnetron sputtering. The effect of substrate pretreatment by BOE solution on the properties of tantalum oxide films was investigated. The characteristics of tantal...
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| Language: | zh-TW |
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2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53462531345377872369 |