STUDY ON THE CURRENT TRANSPORT CHARACTERISTICS OF SI NANODOTS IN A LUMINESCENT SILICON RICH SILICON NITRIDE THIN FILM
博士 === 國立清華大學 === 電機工程學系 === 92 === In this thesis, we produced Si-rich silicon nitride thin film by plasma enhanced chemical vapor deposition. The flow rate of N2 gas precursor was used as the varying parameter from 2 to 160 sccm while keep the flow rate of SiH4 at 40 sccm. The silicon based EL dev...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75872484988207504061 |