Study of Mold Releasing Agent and Surface Energy for Nanoimprint Lithography

碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 92 === There are two major topics in this thesis. One is the research of mold release agents and surface energy for nanoimprint lithography . The other is the temperature distribution of e-beam patterning. The following is the first major topic. As all imprint tech...

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Bibliographic Details
Main Authors: Kun-Fong Shieh, 謝坤峰
Other Authors: Fu-Hsiang Ko
Format: Others
Language:zh-TW
Published: 2004
Online Access:http://ndltd.ncl.edu.tw/handle/32596559059300131719