Two Dimensional Transformer-Coupled-Plasma Fluid Model and Run-to-Run Plasma Etching Equipment Control
碩士 === 國立交通大學 === 機械工程系所 === 92 === The Transformer-Coupled-Plasma is one of the most important and commonly used etching equipment in chip foundry today. In this research, we employ the software “Microsoft Visual Basic” in the computer to construct a basic two dimensional fluid model of TCP (Transf...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/kza29y |