A Study on X-ray Lithography Technique for the fabrication of micro cylindrical concave grating demultiplexer
碩士 === 國立交通大學 === 機械工程系所 === 92 === In this study, the feasibility of using SU-8 resist as a resist for high-resolution X-ray lithography was investigated. Due to the high contrast and sensitivity behaviors of the SU-8 resist, the result showed that its corresponding mask absorber can be thinner and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/qp2g86 |