The Fabrication and Characterization of High Performance Laser-annealed Polycrystalline Silicon Thin-Film Transistors with an Ultra-Thin Amorphous-Silicon Layer
碩士 === 國立交通大學 === 電子工程系所 === 92 === In this thesis, the characteristics of excimer laser annealed low temperature polycrystalline silicon TFT's with/without an ultra-thin a-Si layer have been investigated and compared. With capping an appropriate ultra-thin a-Si layer, the surface roughness of...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/dq74v8 |