Thin Film Preparation and Characterization of Carbon-based Dielectrics for ULSI Interconnect Technology
博士 === 國立交通大學 === 材料科學與工程系所 === 92 === The purpose of this work is research the dielectric properties of a-C and a-SiC:H films, deposited respectively by using gridless ion beam deposition (GIBD) and plasma-enhanced chemical vapour deposition (PECVD), to evaluate the possibility for using in the etc...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/569vwa |