The study of Films thickness use optics

碩士 === 輔仁大學 === 物理學系 === 92 === In experiment use optical monitor system assisted magnetic sputtering growth uniform TiO2 film, Use extreme value Turn point to Control Films thickness uniform.

Bibliographic Details
Main Author:	吳俊勳
Other Authors:	凌國基
Format:	Others
Language:	zh-TW
Published:	2004
Online Access:	http://ndltd.ncl.edu.tw/handle/88896803325788936679

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spelling	ndltd-TW-092FJU001980042016-01-04T04:09:15Z http://ndltd.ncl.edu.tw/handle/88896803325788936679 The study of Films thickness use optics 光學監控系統輔助射頻磁控濺鍍吳俊勳碩士輔仁大學物理學系 92 In experiment use optical monitor system assisted magnetic sputtering growth uniform TiO2 film, Use extreme value Turn point to Control Films thickness uniform. 凌國基 2004 學位論文 ; thesis 42 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 輔仁大學 === 物理學系 === 92 === In experiment use optical monitor system assisted magnetic sputtering growth uniform TiO2 film, Use extreme value Turn point to Control Films thickness uniform.
author2	凌國基
author_facet	凌國基吳俊勳
author	吳俊勳
spellingShingle	吳俊勳 The study of Films thickness use optics
author_sort	吳俊勳
title	The study of Films thickness use optics
title_short	The study of Films thickness use optics
title_full	The study of Films thickness use optics
title_fullStr	The study of Films thickness use optics
title_full_unstemmed	The study of Films thickness use optics
title_sort	study of films thickness use optics
publishDate	2004
url	http://ndltd.ncl.edu.tw/handle/88896803325788936679
work_keys_str_mv	AT wújùnxūn thestudyoffilmsthicknessuseoptics AT wújùnxūn guāngxuéjiānkòngxìtǒngfǔzhùshèpíncíkòngjiàndù AT wújùnxūn studyoffilmsthicknessuseoptics
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The study of Films thickness use optics

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