Numerical study of the flow structure and heat transfer effect in a horizontal CVD reactor
碩士 === 中華大學 === 機械與航太工程研究所 === 92 === Chemical vapor deposition (CVD) is one of the important techniques used in the semiconductor processes. The flow structure and heat transfer effect in a CVD reactor have significant impact on the uniformity and growth rate of the thin film. In the pre...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/39594362725240770424 |