Analysis and Simulation of Excimer Laser Annealing for Recrystallization of Amorphous Silicon Films
碩士 === 長庚大學 === 光電工程研究所 === 92 === Abstract Analysis of the annealing process during excimer laser irradiation was discussed in the research. The mechanisms of grain growth were studied for promoting mobility of poly crystalline films. The experiments of laser annealing were...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2004
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| Online Access: | http://ndltd.ncl.edu.tw/handle/26817996625558670986 |