A study of optical thin film deposited by e-beam deposition for UV application

• Main Authors: Hung Pin Chen, 陳宏彬
• Other Authors: Chung Ping Liu
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/99117613079992978249

碩士 === 元智大學 === 電機工程學系 === 91 === Early in 1817, Fraunhofer had made the anti-reflection thin films with acid-corrosion method. However, the optical films were not developed well until the vacuum deposition equipment appears. Since that application of the optical thin films were widely used due to the military requirements. Recently, because of the progress of rapid lithography technique and the applications in space science, the optical thin films were enormously studied for UV applications. In the space telemetry, for example, the scientists explore the unknown phenomenon of lighten in the space, the measurements of the red sprit, the Huggins absorption bands. Hence, the optical thin films become a very important technology in UV applications. In this thesis, Al2O3 and SiO2 optical thin films for UV applications deposited by e-beam evaporation technique were studied. We had executed a series of measurements on the optical constants of refractive index, extinction coefficient, and transmittance to study the optical properties of the materials, and scanned the sample surface to understand the amorphousness and surface roughness of the microstructure. For this study, the AR coatings composed of Al2O3 and SiO2 thins for UV applications were prepared. Passing through this study, we expect to obtain more information about the optical thin films in UV applications in the future.