DESIGN AND FABRICATION OF BRIDGE TYPE CHANNEL WAVEGUIDES BASED ON SILICON (100) SUBSTRATE
碩士 === 大同大學 === 光電工程研究所 === 91 === We take the substrate structure of silicon of (100) to fabricate the channel waveguides by ICP-RIE dry etching system. In the dry etching process, we point in relation of the etching masks with the etching limit time, the etching rate with the different...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83190996789364624138 |