A study of thin film prepared by plasma sputtering and simulated with CFD
碩士 === 中國文化大學 === 材料科學與製造研究所 === 91 === In this project, a numerical model of plasma sputtering was designed and simulated with CFD-ACE+ under various conditions. The target of this research was to find the optimum sputtering deposition conditions and the model was modified compared with the experim...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/61694252726450240732 |