Novel method of 3D nano- and micro-lithography fabrication system

• Main Authors: HWANG/SUNGJIN, 黃聖鎮
• Other Authors: S.H.CHANG
• Format: Others
• Language: zh-TW
• Published: 2003
• Online Access: http://ndltd.ncl.edu.tw/handle/10331654752580331706

碩士 === 國立臺灣大學 === 機械工程學研究所 === 91 === The 3D-micromachining is a key technology in minimization machine. Anisotropy etching method is the most popular method to fabricate 3D microstructure in MEMS. But, It is hard to MEMS machine arbitrary 3D microstructure. Now, many kind of 3D microstructure fabrications were developed, in which microlithography was changing characteristics in local area of photoresister, which illuminated UV light. These changed areas ware assembled 3D microstructure called microstereolithography fabrication. Microstereolithography system was composed UV light source, optical focusing system and nano precision position stage system. UV LED was sourcing of UV light. Also focusing system was provided microscope focusing system. Then precision position stage was adopted nano precision position stage which was developed. Nano precision position stage was had specifications that are maximum displacement 100μm and maximum resolution below 10nm. And nano position stage combine between piezoelectric (PZT) actuator and mechanical displacement amplifier. Mechanical amplifier was used flexible mechanism and plane spring. This fabrication’s main factors were photoresister’s reactive light wave length, UV wave length, focusing area and light intensity. This technique could easily fabricate 3D microstructures.