The Study of the Optimal Test Run Policy and Stepper Dispatch Rule under different Production Conditions for Photolithography Process in Semiconductor Manufacturing

碩士 === 國立臺灣大學 === 機械工程學研究所 === 91 === In semiconductor manufacturing, photolithography (PL), being a most repeated process, is a critical process, since meeting tolerance on critical dimensions and alignment with the previous layers. In order to check conformance to process specifications, test runs...

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Bibliographic Details
Main Authors: Chi-cheng Lu, 呂啟誠
Other Authors: Suhua Hsieh
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/29951885515351149605