Characteristics and Plasma effects on MOSFET Devices with HfOxNyGate Dielectrics

碩士 === 國立清華大學 === 工程與系統科學系 === 91 ===

Bibliographic Details
Main Authors: Jack P.H. Tsai, 蔡秉宏
Other Authors: S.H. Li
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/40813786199477234900