The Electrical Properties of Zirconium Oxide ZrO2 Thin Film Capacitor and Metal-ZrO2-Semiconductor Field Effect Transistors

碩士 === 國立清華大學 === 電子工程研究所 === 91 === In this work, the electrical characteristics of Au/ZrO2/Silicon(P-type) (MIS) capacitors and n-channel metal gate metal-oxide-semiconductor field effect transistors (MOSFET) with ZrO2 gate dielectric are investigated. The ZrO2 thin films are deposited by magnetro...

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Bibliographic Details
Main Authors: Che-Wei Chang, 張哲維
Other Authors: Joseph Ya-Min Lee
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/60947781879574973620