Growth of Boron-doped Diamond Films on Porous Silicon by Microwave Plasma Chemical Vapor Deposition

碩士 === 國立中山大學 === 物理學系研究所 === 91 === Synthetic diamond thin films have potential for fabricating high-temperature semiconducting and optical devices because of its extraordinary properties. In this work, a microwave plasma chemical vapor deposition system has been setup. A two-steps deposition proce...

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Bibliographic Details
Main Authors: Yao-Li Chuang, 莊曜勵
Other Authors: Tai-Fa Young
Format: Others
Language:en_US
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/63852928769722690310