Magnetically Enhanced Dual Frequency Capacitive Discharge

碩士 === 國立東華大學 === 電機工程學系 === 91 === Abstract According to the technical roadmap, the density of transistor will be double in every 18 months, therefore the size of the transistor ruled keep shrinking 0.7 in every generation. Plasma processes must be served at low enough pressure for anisot...

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Bibliographic Details
Main Authors: Chih-Hung Hsiao, 蕭志宏
Other Authors: Bing-Hung Chen
Format: Others
Language:zh-TW
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/41686023723778605140