| Summary: | 碩士 === 國立中央大學 === 化學工程與材料工程研究所 === 91 === Abstract
There are two major parts in this thesis. One is the fabrication of three-dimensional non-planar devices with electron beam lithography. The other is the surface treatment and characterization for application in microfluidic device.
The design of non-planar microfluidic channel for the fabrication of three-dimensional non-planar devices with electron beam lithography such as oblique structure is beneficial for future bio-devices. The oblique structure exhibits the advantage of driving fluid with diversification. This study focuses on the modification of SU-8 resist by e-beam and fabrication of three-dimensional devices. The oblique structure of SU-8 polymer material at special dose design is successfully fabricated by electron beam technology. Furthermore, the convex profile, the concave profile or slopes of the profiles can be obtained by only changing the dosage and the unit distance. In addition, the reaction mechanism of the SU-8 material under electron beam exposure is discussed in detail.
The SU8-50 resist about the surface treatment and characterization for application in microfluidic device is used to fabricate the micro-channel devices and the character of hydrophobic and hydrophilic in micro-channel is evaluated. Oxygen-plasma-treated is used to affect the hydrophobic and hydrophilic surfaces of thickness film. From contact angle measurement, the SU8-50 film transformed the hydrophobic property into hydrophilic property after suitable oxygen plasma treatment. The SEM analysis revealed the spherulitic structure of nano-lamellae from polymerization of SU8-50 resists with oxygen plasma-treated time. AFM is used to study the roughness on the surface of oxygen plasma treated SU8-50 membrane. In addition, the etching selectivity of thermal oxide and poly-Si has been examined with the gas CHF3 / CF4 and Cl2 / O2, respectively.
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