Forecasting Model of Post CMP Planarity with Pad Properties
碩士 === 國立交通大學 === 科技管理學程碩士班 === 91 === Selective oxide CMP methods like ILD and PMD CMP are commonly used in achieving global planarization for schemes of quarter micron processes and beyond. PMD & ILD CMP process offers great advantages in processing devices with better global planar...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70992642119388942625 |