A Novel Embedded Root Method for Constructing Thick Metal Microstructures with SU-8 Photoresist in UV-LIGA Process
博士 === 國立交通大學 === 機械工程系 === 91 === The photoresist, NANOTM XP SU-8, has been implemented in the fabrication of high-aspect-ratio microstructures in low-cost MEMS production. However, the reachable thickness of the electroplated structures standing on the substrate were limited to 50 mm b...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/61088919993104585621 |