The Investigation of Data Retention in a Direct Tunneling Regime Gate Oxide SONOS Memory Cell

碩士 === 國立交通大學 === 電子工程系 === 91 === SONOS (Silicon Oxide Nitride Oxide Silicon) will become the main stream of nonvolatile memory products because of its simplicity in structure and scalable by comparing with conventional floating gate cells. For the scaling of SONOS memory, the endurance...

Full description

Bibliographic Details
Main Authors: Pu-Yao Chiang, 蔣步堯
Other Authors: S. S. Chung
Format: Others
Language:en_US
Published: 2003
Online Access:http://ndltd.ncl.edu.tw/handle/39027079769327552161