Applications and Effects of liner layers on the Fabrication of beyond sub-micron MOS integrated circuits
博士 === 國立交通大學 === 材料科學與工程系 === 91 === To improve the reliability of MOS devices, various liner films have been applied to different stages of the integrated circuit manufacturing processes. A liner layer can be used as a stress-release buffer film, a adhesion promoting layer, or a barrier...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2003
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| Online Access: | http://ndltd.ncl.edu.tw/handle/22639257303275208772 |